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Single wafer cleaning machine,Wafer cleaning machine

A single wafer cleaning machine is a high cleanliness cleaning and drying equipment for materials such as semiconductor wafers. Through high-speed rotation, the liquid on the wafer is quickly dried and quickly dried to achieve high efficiency cleaning and drying effects. This device is particularly suitable for different sizes of wafers and can be adapted to different wafer sizes by changing the drying head. The main application areas of monolithic cleaning dryers include wet cleaning processes in semiconductor manufacturing. It is one of the key equipment in the wet cleaning process and is mainly used for the drying of 2-8 inch semiconductor wafers, mask plates and various other substrates. In addition, this device is also widely used in the field of LED epitaxy and chip manufacturing, is one of the indispensable equipment in these fields.

MetInfo enterprise content manager system | MetInfo CMS

MetInfo enterprise content manager system | MetInfo CMS

MetInfo enterprise content manager system | MetInfo CMS

MetInfo enterprise content manager system | MetInfo CMS


A. Equipment overview

1.1 Application fields: Single piece cleaning and drying machine is a high cleanliness cleaning and drying equipment, with the characteristics of liquid corrosion, pure water cleaning, high-speed drying, nitrogen drying and so on. Different wafer sizes can be achieved by quickly changing the drying head. It is the main equipment of wet cleaning process, small size and smooth operation. It is mainly used for the cleaning and drying process of 2-8 inch semiconductor wafers, mask plates, various substrates and other materials. It has the advantages of low cost, fast application and production.

1.2 Name: Single piece cleaning and drying machine

1.3 Model: QSG-150-2Y

 

B.  Main structural features

Single piece cleaning dryer main servo motor, PLC controller, man-machine interface, high clean valve, PFA tube, nitrogen heater, anti-corrosion shell, and spin dry and other parts.

2.1 Material: Imported PP board, can meet the clean room working environment.

2.2 Special servo motor, can achieve 10-3000 RPM, low speed uniform cleaning, high speed centrifugal drying.

2.3 Industrial PLC controller and man-machine interface, stable and reliable control of each component, intuitive and visual operation mode.

2.4 High-power nitrogen heater, fast heating nitrogen, improve drying efficiency.

2.5 Drying head details can be customized according to customer needs for different sizes of drying head.

2.6 It can be configured with multiple groups of liquid medicine flushing, and has the function of liquid medicine suction.

 

C. Main technical parameters

 

Project

Main performance indicators and parameters

Processing wafer size

2-8 inch discs

Quantity of drying per session

One piece

Number of stations (units)

one

Liqour tank

two

Liquid heating

equip

Liquid spray nozzle

two

Pure water nozzle

one

Nitrogen nozzle

one

rotational speed RPM/MIN

10-3000

Wash and dry time

2-5min

Chamber and nitrogen heating method

Electric heater

nitrogen gas pressure

0.25Mpa, nitrogen pipe connector 6mm

Pure water pressure

0.15Mpa, pipe interface 6mm

Drain pipe

12mm sleeve connector

Control system

PLC programmable controller

Display

4.3-inch touch screen

Power supply

220V

Machine power

2KW

Dimensions (D * W * H)mm

D 420mm*W 420mm*H 535mm





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