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Single crystal furnace, crystal growth furnace, Gallium arsenide VGF single crystal furnace, automatic VGF lifting long crystal furnace, VGF Cadmium zinc telluride long crystal furnace

A single crystal furnace is a device for the production of single crystal materials, its main function is to melt polycrystalline materials such as polysilicon through a graphite heater in an inert gas (such as nitrogen, helium or argon) environment, and grow single crystals without dislocation using the czerotene method. Such devices are widely used in semiconductor manufacturing and photovoltaic power generation.

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A. Equipment overview

1.1 Application: It is mainly used for the growth of 2-6 inch germanium single crystal, gallium arsenide, cadmium zinc telluride and other compound crystals.
1.2 Product Features:
1.2.1 Industrial computer control system (WINDOWS system interface, easy and simple operation);
1.2.2 All key components are imported to ensure high reliability of the equipment;
1.2.3 High temperature control precision and good temperature control stability in temperature zone;
1.2.4 With power failure alarm, over/under temperature alarm, limit over temperature alarm and other safety protection functions;
1.2.5 Good crystal growth uniformity and high repeatability.

B.Main technical parameters

Operating temperature

6001280℃

Fit crystal size

26inches

Charge quantity

15Kg/furnace

Heating control

7-stage control

Length of warm zone

800mm±0.5℃10001280℃ customizable

Heating rate

15℃/min

Lifting stroke

900mm

Minimum lift rateVB

0.1mm/h

Supporting equipment

Synthetic furnace, ingot furnace, deoxidized tube sealing furnace, etc


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